Introduction Day – ITP 2026: Launch of the Leading Semiconductor Training Program This Summer

After five successful seasons, the Intensive Training Program (ITP) 2026 officially returns, offering an in-depth training opportunity for students passionate about integrated circuit design and aspiring to build a career in the semiconductor industry.

The Introduction Day – ITP 2026 event provides a comprehensive overview of the 13-week international-standard training program, designed to equip participants with the competencies required to become globally competitive IC engineers. It also serves as an opportunity for students to explore the learning pathway, career prospects, and engage directly with industry experts. Notably, statistics from previous cohorts show that over 90% of participants secured positions at leading semiconductor companies within three months of completing the program.

With more than four years of implementation and over 250 participating students, ITP 2026 introduces several notable advancements. The program is hosted for the first time by the University of Science, VNU-HCM, with the collaboration of experienced experts from Synopsys. The training model is designed to closely integrate academic knowledge with industry demands, providing a strong foundation for students to enter the workforce.

Program Information – Introduction Day ITP 2026:

- Target participants: Third- and fourth-year students majoring in IC design or related fields at universities in Ho Chi Minh City

- Speakers:

+ Assoc. Prof. Dr. Le Duc Hung, Head of Electronics Department, Director of DESLAB, Faculty of Electronics and Telecommunications, University of Science, VNU-HCM

+ Mr. Nguyen Minh Hung, Manager, Applications Engineering

- Time: 10:00 – 11:00, April 22, 2026

- Format: Online via Zoom

- Registration: here

Interested students are encouraged to register and take advantage of this opportunity to access a high-quality semiconductor training program and shape their career pathway in the semiconductor technology field.